SurPass photoresist adhesion promoters by DisChem ensure superior adhesion on a wide variety of substrate materials. Designed for microlithography, these promoters modify the substrate surface energy without depositing a film or altering the substrate chemistry. Easy to apply by spin coat, immersion, or spray, SurPass enhances resist adhesion, improves coating properties, and eliminates the need for pre-wetting solvents. Non-hazardous and waterborne, it is an environmentally friendly solution for advanced lithographic processes.