DisChem's EBL anti-charging agent, DisCharge, is formulated to mitigate charging effects during electron beam lithography. This agent enhances pattern accuracy and uniformity by effectively dissipating accumulated charge. Compatible with a variety of resist materials, DisCharge is an essential addition to your EBL process, ensuring precise and reliable results. Non-hazardous and easy to apply, it supports improved performance and reduced defects in high-resolution lithographic applications.